Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5338398 | Tungsten silicide etch process selective to photoresist and oxide | Robert Lum, Thierry Fried | 1994-08-16 |
| 5296093 | Process for removal of residues remaining after etching polysilicon layer in formation of integrated circuit structure | Ian Latchford, Isamu Namose, Kazumi Tsuchida | 1994-03-22 |
| 5228950 | Dry process for removal of undesirable oxide and/or silicon residues from semiconductor wafer after processing | Jennifer M. Webb, Zahra H. Amini | 1993-07-20 |
| 5147499 | Process for removal of residues remaining after etching polysilicon layer in formation of integrated circuit structure | Ian Latchford, Isamu Namose, Kazumi Tsuchida | 1992-09-15 |