Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8223285 | Active matrix device, method for manufacturing switching element, electro-optical display device, and electronic apparatus | — | 2012-07-17 |
| 8013849 | Active-matrix device, electro-optical display device, and electronic apparatus | — | 2011-09-06 |
| 7999987 | Electro-optical display device and electronic device | — | 2011-08-16 |
| 7952041 | Active-matrix device, electro-optical display device, and electronic apparatus | — | 2011-05-31 |
| 7692195 | Active-matrix device, electro-optical display device, and electronic apparatus | — | 2010-04-06 |
| 7067813 | Infrared absorption measurement method, infrared absorption measurement device, and method of manufacturing semiconductor device | — | 2006-06-27 |
| 7057175 | Infrared absorption measurement method, infrared absorption measurement device, and method of manufacturing semiconductor device | — | 2006-06-06 |
| 7037843 | Plasma etching method | — | 2006-05-02 |
| 6838011 | Method of processing PFC and apparatus for processing PFC | — | 2005-01-04 |
| 6821380 | Temperature adjustment apparatus | — | 2004-11-23 |
| 6649530 | Plasma etching at reduced pressure | — | 2003-11-18 |
| 6642521 | Method for measuring greenhouse gases using infrared absorption spectrometer | Toshikazu Sugiura | 2003-11-04 |
| 5520770 | Method of fabricating semiconductor device | — | 1996-05-28 |
| 5348910 | Method of manufacturing a semiconductor device and the product thereby | — | 1994-09-20 |
| 5332464 | Semiconductor device manfuacturing apparatus | — | 1994-07-26 |
| 5296093 | Process for removal of residues remaining after etching polysilicon layer in formation of integrated circuit structure | Chester A. Szwejkowski, Ian Latchford, Kazumi Tsuchida | 1994-03-22 |
| 5294294 | Method of dry etching in semiconductor device processing | — | 1994-03-15 |
| 5206535 | Semiconductor device structure | — | 1993-04-27 |
| 5200016 | Semiconductor device manufacturing apparatus | — | 1993-04-06 |
| 5173151 | Method of dry etching in semiconductor device processing | — | 1992-12-22 |
| 5147499 | Process for removal of residues remaining after etching polysilicon layer in formation of integrated circuit structure | Chester A. Szwejkowski, Ian Latchford, Kazumi Tsuchida | 1992-09-15 |
| 4980311 | Method of fabricating a semiconductor device | — | 1990-12-25 |
| 4923821 | Forming trench in semiconductor substrate with rounded corners | — | 1990-05-08 |