Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6964874 | Void formation monitoring in a damascene process | Thomas Werner, Frank Koschinsky | 2005-11-15 |
| 6806191 | Semiconductor device with a copper line having an increased resistance against electromigration and a method of forming the same | Christian Zistl, Jörg Hohage, Hartmut Rülke | 2004-10-19 |
| 6716650 | Interface void monitoring in a damascene process | Eckhard Langer, Frank Koschinsky, Volker Kahlert | 2004-04-06 |
| 6613660 | Metallization process sequence for a barrier metal layer | Volker Kahlert, Frank Koschinsky | 2003-09-02 |