| 10041856 |
Method and apparatus for measuring physical displacement |
John J. Martin |
2018-08-07 |
| 6024882 |
Process and apparatus for water decontamination |
Reid Henry Bowman, Terry Applebury, Doug Gustafson |
2000-02-15 |
| 5851407 |
Process and apparatus for oxidation of contaminants in water |
Reid Henry Bowman, Terry Applebury, Douglas C. Gustafson |
1998-12-22 |
| 5762755 |
Organic preclean for improving vapor phase wafer etch uniformity |
John deLarios, Glenn Nobinger, Wilbur C. Krusell, Dah-Bin Kao, Ralph K. Manriquez +1 more |
1998-06-09 |
| 5294568 |
Method of selective etching native oxide |
Bruce E. Deal, Dah-Bin Kao, John M. de Larios |
1994-03-15 |
| 5044314 |
Semiconductor wafer processing apparatus |
— |
1991-09-03 |
| 4956046 |
Semiconductor substrate treating method |
— |
1990-09-11 |
| 4891335 |
Semiconductor substrate heater and reactor process and apparatus |
— |
1990-01-02 |
| 4778559 |
Semiconductor substrate heater and reactor process and apparatus |
— |
1988-10-18 |
| 4496609 |
Chemical vapor deposition coating process employing radiant heat and a susceptor |
Walter C. Benzing |
1985-01-29 |
