JA

Jose I. Arno

AC Advanced Technology & Materials Co.: 45 patents #6 of 410Top 2%
EN Entegris: 7 patents #86 of 643Top 15%
CM Cabot Microelectronics: 1 patents #131 of 207Top 65%
📍 Brookfield, CT: #7 of 302 inventorsTop 3%
🗺 Connecticut: #381 of 34,797 inventorsTop 2%
Overall (All Time): #46,026 of 4,157,543Top 2%
55
Patents All Time

Issued Patents All Time

Showing 26–50 of 55 patents

Patent #TitleCo-InventorsDate
7501010 Rectangular parallelepiped fluid storage and dispending vessel Dennis Brestovansky, Michael J. Wodjenski, J. Donald Carruthers, Philip A. Moroco 2009-03-10
7373257 Photometrically modulated delivery of reagents 2008-05-13
7351976 Monitoring system comprising infrared thermopile detector 2008-04-01
7325560 In-situ gas blending and dilution system for delivery of dilute gas at a predetermined concentration James Dietz 2008-02-05
7253002 Fluid storage and dispensing vessels having colorimetrically verifiable leak-tightness, and method of making same Paul J. Marganski, Edward A. Sturm, Kristy L. Zaleta 2007-08-07
7172918 Infrared thermopile detector system for semiconductor process monitoring and control 2007-02-06
7129519 Monitoring system comprising infrared thermopile detector 2006-10-31
7063097 In-situ gas blending and dilution system for delivery of dilute gas at a predetermined concentration James Dietz 2006-06-20
7058519 Photometrically modulated delivery of reagents 2006-06-06
7018448 Gas cabinet including integrated effluent scrubber Michael J. Wodjenski 2006-03-28
7011614 Infrared thermopile detector system for semiconductor process monitoring and control 2006-03-14
6991671 Rectangular parallelepiped fluid storage and dispensing vessel Dennis Brestovansky, Michael J. Wodjenski, J. Donald Carruthers 2006-01-31
6947138 Optical sensor system and method for detection of hydrides and acid gases 2005-09-20
6909973 Photometrically modulated delivery of reagents 2005-06-21
6905663 Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas 2005-06-14
6841141 System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (XFn) compounds for use in cleaning semiconductor processing chambers W. Karl Olander 2005-01-11
6833024 Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions Mark Holst, Rebecca Faller, Glenn M. Tom, Ray Dubois 2004-12-21
6821795 Infrared thermopile detector system for semiconductor process monitoring and control 2004-11-23
6759018 Method for point-of-use treatment of effluent gas streams Mark Holst, Sam Yee, Joseph D. Sweeney, Jeff Lorelli, Jason Deseve 2004-07-06
6749671 Abatement of effluents from chemical vapor deposition processes using organometallic source reagents Mark Holst, Ray Dubois, Rebecca Faller, Glenn M. Tom 2004-06-15
6716271 Apparatus and method for inhibiting decomposition of germane Edward A. Sturm, Luping Wang, James Dietz 2004-04-06
6620256 Non-plasma in-situ cleaning of processing chambers using static flow methods Luping Wang, Glenn M. Tom 2003-09-16
6617175 Infrared thermopile detector system for semiconductor process monitoring and control 2003-09-09
6576573 Atmospheric pressure plasma enhanced abatement of semiconductor process effluent species 2003-06-10
6540814 Integrated ion implant scrubber system Michael W. Hayes, Mark Holst, Glenn M. Tom 2003-04-01