TS

Tsubasa Shiratori

AD Adeka: 12 patents #17 of 499Top 4%
Samsung: 7 patents #17,688 of 75,807Top 25%
Overall (All Time): #368,580 of 4,157,543Top 9%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
11967502 Methods of forming material layer, semiconductor devices, and methods of manufacturing the same Younsoo Kim, Jaewoon Kim, Haeryong KIM, Jinho Lee 2024-04-23
11807652 Tungsten compound, raw material for thin film formation and method for producing thin film Akio Saito, Yutaro Aoki 2023-11-07
10927460 Raw material for forming thin film, and method for manufacturing thin film Hiroki Sato, Naoki Yamada, Haruyoshi Sato 2021-02-23
10913754 Lanthanum compound and methods of forming thin film and integrated circuit device using the lanthanum compound Gyu-hee Park, Youn Soo Kim, Jae-Soon Lim, Youn-Joung Cho, Kazuki HARANO +2 more 2021-02-09
10900119 Tungsten precursor and method of forming Tungsten containing layer using the same Soyoung Lee, Jaesoon Lim, Jieun Yun, Akio Saito, Yutaro Aoki 2021-01-26
10651031 Tantalum compound Seung-min Ryu, Takanori Koide, Naoki Yamada, Jae-Soon Lim, Youn-Joung Cho 2020-05-12
10364495 Method for producing a thin film Tomoharu Yoshino, Atsushi Sakurai, Masako HATASE, Hiroyuki Uchiuzou, Akihiro Nishida 2019-07-30
10155784 Alcohol compound Atsushi Sakurai, Masako HATASE, Naoki Yamada, Akio Saito, Tomoharu Yoshino 2018-12-18
10134582 Tantalum compound and methods of forming thin film and fabricating integrated circuit device by using the same Seung-min Ryu, Takanori Koide, Naoki Yamada, Jae-Soon Lim, Youn-Joung Cho 2018-11-20
9960032 Methods of forming thin films and methods of fabricating integrated circuit devices using the same Jae-wan Chang, Youn Soo Kim 2018-05-01
9896468 Metal alkoxide compound, thin-film-forming material, method for producing thin film, and alcohol compound Atsushi Sakurai, Masako HATASE, Naoki Yamada, Akio Saito, Tomoharu Yoshino 2018-02-20
9663538 Aluminum compound, thin-film forming raw material, and method for producing thin film Tomoharu Yoshino, Atsushi Sakurai, Masako HATASE, Hiroyuki Uchiuzou, Akihiro Nishida 2017-05-30
9437419 Method of forming a layer using a trialkylsilane silicon precursor compound Younsoo Kim, Sangyeol Kang, Hiroki Sato, Naoki Yamada, Chayoung Yoo +3 more 2016-09-06