Issued Patents 2025
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12422755 | Semiconductor processing tool and methods of operation | Tai-Yu Chen, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu | 2025-09-23 |
| 12405529 | Lithography system and methods | Cheng-Hung Tsai, Shang-Chieh Chien, Heng-Hsin Liu, Li-Jui Chen | 2025-09-02 |
| 12372878 | Inspection system for extreme ultraviolet (EUV) light source | Chiao-Hua Cheng, Heng-Hsin Liu, Li-Jui Chen, Shang-Chieh Chien | 2025-07-29 |
| 12372886 | Acoustic particle deflection in lithography tool | Tai-Yu Chen, Kai Tak Lam, Sagar Deepak Khivsara, Shang-Chieh Chien | 2025-07-29 |
| 12372887 | Methods of cleaning a lithography system | Cho-Ying Lin, Tai-Yu Chen, Chieh Hsieh, Shang-Chieh Chien, Li-Jui Chen +1 more | 2025-07-29 |
| 12360458 | Radiation collector | Cheng-Hung Tsai, Shang-Chieh Chien, Heng-Hsin Liu, Li-Jui Chen | 2025-07-15 |
| 12353142 | Semiconductor processing tool and methods of operation | Cheng-Hung Tsai, Shang-Chieh Chien, Heng-Hsin Liu, Li-Jui Chen | 2025-07-08 |
| 12287572 | Lithography system and methods | Cheng-Hung Tsai, Shang-Chieh Chien, Heng-Hsin Liu, Li-Jui Chen | 2025-04-29 |
| 12235593 | System and method for dynamically controlling temperature of thermostatic reticles | Tzu-Jung Pan, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu | 2025-02-25 |
| 12228863 | EUV light source contamination monitoring system | Cheng-Hung Tsai, Heng-Hsin Liu, Li-Jui Chen, Shang-Chieh Chien | 2025-02-18 |
| 12216413 | Device and method to remove debris from an extreme ultraviolet (EUV) lithography system | Chun-Han Lin, Chieh Hsieh, Shang-Chieh Chien, Heng-Hsin Liu, Li-Jui Chen | 2025-02-04 |
| 12210295 | Reticle cleaning device and method of use | Che-Chang Hsu, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu | 2025-01-28 |
| 12189298 | EUV vessel perimeter flow auto adjustment | Che-Chang Hsu, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu | 2025-01-07 |