| 12400845 |
Ion energy control on electrodes in a plasma reactor |
Yue Guo, Haitao Wang, Kartik Ramaswamy |
2025-08-26 |
| 12368020 |
Pulsed voltage source for plasma processing applications |
A N M Wasekul AZAD, Kartik Ramaswamy, Yue Guo, Fernando Silveira |
2025-07-22 |
| 12347647 |
Plasma excitation with ion energy control |
Yue Guo, Kartik Ramaswamy |
2025-07-01 |
| 12334304 |
System and methods for implementing a micro pulsing scheme using dual independent pulsers |
A N M Wasekul AZAD, Kartik Ramaswamy, Yue Guo, Nicolas Bright |
2025-06-17 |
| 12334383 |
Substrate support gap pumping to prevent glow discharge and light-up |
James D. Carducci, Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, Silverst Rodrigues |
2025-06-17 |
| 12293897 |
Radio frequency diverter assembly enabling on-demand different spatial |
Kartik Ramaswamy, Yue Guo, A N M Wasekul AZAD, Nicolas Bright |
2025-05-06 |
| 12272524 |
Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics |
Yue Guo, Kartik Ramaswamy, Jie Yu |
2025-04-08 |
| 12266506 |
Scanning impedance measurement in a radio frequency plasma processing chamber |
Yue Guo, Kartik Ramaswamy, Nicolas Bright, A N M Wasekul AZAD |
2025-04-01 |
| 12261019 |
Voltage pulse time-domain multiplexing |
Kartik Ramaswamy, Yue Guo |
2025-03-25 |
| 12205797 |
Solid-state switch based high-speed pulser with plasma IEDF modification capability through multilevel output functionality |
Kartik Ramaswamy, Yue Guo, Fernando Silveira, A. N. M. Wasekul Azad |
2025-01-21 |
| 12195830 |
Aluminum alloy, preparation method, and aluminum alloy structural member |
Qiang Guo, Xiaodong Wang, Mengjue Liao |
2025-01-14 |
