Issued Patents 2024
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12037517 | Ruthenium CMP chemistry based on halogenation | — | 2024-07-16 |
| 11915941 | Dynamically adjusted purge timing in wet atomic layer etching | Jacques Faguet, Tetsuya Sakazaki | 2024-02-27 |
| 11866831 | Methods for wet atomic layer etching of copper | Christopher NETZBAND, Jacques Faguet, Arkalgud R. Sitaram | 2024-01-09 |