| 12037434 |
Chemical compositions and methods of patterning microelectronic device structures |
Eungnak Han, Gurpreet Singh, Tayseer Mahdi, Florian Gstrein, Lauren Doyle +2 more |
2024-07-16 |
| 12036578 |
Interconnect structure surface modifications by passivating agents |
Florian Gstrein, Eungnak Han, Rami Hourani, Tayseer Mahdi |
2024-07-16 |
| 12027458 |
Subtractively patterned interconnect structures for integrated circuits |
Kevin Lin, Noriyuki Sato, Tristan A. Tronic, Michael Christenson, Christopher J. Jezewski +10 more |
2024-07-02 |
| 12012473 |
Directed self-assembly structures and techniques |
Robert L. Bristol, Xuanxuan Chen, Lauren Doyle, Florian Gstrein, Eungnak Han +6 more |
2024-06-18 |
| 11984317 |
EUV patterning methods, structures, and materials |
Marie Krysak, Lauren Doyle, Brian Zaccheo, Patrick Theofanis, Michael Robinson +1 more |
2024-05-14 |
| 11955377 |
Differential hardmasks for modulation of electrobucket sensitivity |
Kevin Lin, Robert L. Bristol, Rami Hourani, Marie Krysak |
2024-04-09 |
| 11955343 |
Two-stage bake photoresist with releasable quencher |
Robert L. Bristol, Marie Krysak, Florian Gstrein, Kent N. FRASURE |
2024-04-09 |
| 11953826 |
Lined photobucket structure for back end of line (BEOL) interconnect formation |
Robert L. Bristol, Marie Krysak, Florian Gstrein, Eungnak Han, Kevin Lin +2 more |
2024-04-09 |
| 11874600 |
Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resists |
Marie Krysak, Robert L. Bristol, Florian Gstrein |
2024-01-16 |