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Frame reveals with maskless lithography in the manufacture of integrated circuits |
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Metal oxycarbide resists as leave behind plugs |
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| 12037434 |
Chemical compositions and methods of patterning microelectronic device structures |
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| 12012473 |
Directed self-assembly structures and techniques |
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| 11955377 |
Differential hardmasks for modulation of electrobucket sensitivity |
Kevin Lin, James M. Blackwell, Rami Hourani, Marie Krysak |
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| 11955343 |
Two-stage bake photoresist with releasable quencher |
Marie Krysak, James M. Blackwell, Florian Gstrein, Kent N. FRASURE |
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| 11953826 |
Lined photobucket structure for back end of line (BEOL) interconnect formation |
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| 11874600 |
Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resists |
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2024-01-16 |