Issued Patents 2023
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11798810 | Resist underlayer film-forming composition containing amide solvent | Hikaru TOKUNAGA, Satoshi Hamada, Keisuke Hashimoto | 2023-10-24 |
| 11720024 | Resist underlayer film-forming composition containing indolocarbazole novolak resin | Hikaru TOKUNAGA, Daigo Saito, Keisuke Hashimoto | 2023-08-08 |
| 11681223 | Photocurable composition and method for producing semiconductor device | Hikaru TOKUNAGA, Takafumi Endo, Keisuke Hashimoto | 2023-06-20 |
| 11675270 | Resist underlayer film-forming composition | Tokio NISHITA | 2023-06-13 |
| 11674053 | Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure | Takafumi Endo, Yasunobu Someya, Hiroyuki Wakayama | 2023-06-13 |
| 11675269 | Composition for forming resist overlayer film for EUV lithography | Bangching Ho, Takafumi Endo | 2023-06-13 |
| 11650505 | Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound | Hirokazu Nishimaki, Keisuke Hashimoto, Takafumi Endo | 2023-05-16 |
| 11592747 | Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin | Yasunobu Someya, Ryo Karasawa, Keisuke Hashimoto, Tetsuya Shinjo | 2023-02-28 |