DS

Devika Sil

IBM: 1 patents #2,552 of 6,852Top 40%
📍 Rensselaer, NY: #5 of 19 inventorsTop 30%
🗺 New York: #4,092 of 11,993 inventorsTop 35%
Overall (2023): #464,932 of 537,848Top 90%
1
Patents 2023

Issued Patents 2023

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
11756786 Forming high carbon content flowable dielectric film with low processing damage Benjamin D. Briggs, Donald F. Canaperi, Huy Cao, Thomas J. Haigh, Jr., Son V. Nguyen +2 more 2023-09-12