Issued Patents 2023
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11842665 | Display panel and display device | Cong Liu, Lili DU, Feng Wei | 2023-12-12 |
| 11839123 | Display substrate and display device | Feng Wei, Lili DU | 2023-12-05 |
| 11810924 | Display substrate, method for manufacturing display substrate, and display device | Huijie Meng, Erlong Song, Cong Liu, Feng Wei | 2023-11-07 |
| 11804178 | Display substrate and display device | Lili DU, Wen Tan, Cong Liu | 2023-10-31 |
| 11790847 | Display substrate and display device | Lili DU, Kaipeng SUN, Yue Long | 2023-10-17 |
| 11784642 | Touch circuit, touch panel and display device | Erlong Song, Fei Yu, Huijie Meng, Bo Wei, Lili DU | 2023-10-10 |
| 11721291 | Display substrate and display apparatus | Lili DU, Bo Wei, Qian Ma | 2023-08-08 |
| 11718767 | Chemical mechanical planarization composition for polishing oxide materials and method of use thereof | Ming-Shih Tsai, Chia-Chien Lee, Rung-Je Yang, Anu Mallikarjunan, Chris Keh-Yeuan Li +2 more | 2023-08-08 |
| 11711956 | Display substrate and display apparatus | Lili DU, Bo Wei | 2023-07-25 |
| 11692110 | Low oxide trench dishing chemical mechanical polishing | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Mark Leonard O'Neill | 2023-07-04 |
| 11667839 | Low oxide trench dishing chemical mechanical polishing | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Mark Leonard O'Neill | 2023-06-06 |
| 11620953 | Display substrate and display device | Kaipeng SUN, Yue Long, Feng Wei | 2023-04-04 |
| 11608451 | Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal rates | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Mark Leonard O'Neill | 2023-03-21 |
| 11549034 | Oxide chemical mechanical planarization (CMP) polishing compositions | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Mark Leonard O'Neill | 2023-01-10 |