Issued Patents 2022
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11482620 | Interfacial layer between Fin and source/drain region | Chih-Yun Chin, Chii-Horng Li, Chien-Wei Lee, Hsueh-Chang Sung, Heng-Wen Ting +5 more | 2022-10-25 |
| 11476331 | Supportive layer in source/drains of FinFET devices | Jung-Chi Tai, Chii-Horng Li, Pei-Ren Jeng, Yan-Ting Lin, Chih-Yun Chin | 2022-10-18 |
| 11430878 | Method for fabricating semiconductor device | Chii-Horng Li, Chien-I Kuo, Heng-Wen Ting, Jung-Chi Tai, Lilly Su +1 more | 2022-08-30 |
| 11271096 | Method for forming fin field effect transistor device structure | Chien-Wei Lee, Hsueh-Chang Sung, Yee-Chia Yeo | 2022-03-08 |
| 11264237 | Method of epitaxy and semiconductor device | Chih-Yun Chin, Tzu-Hsiang Hsu, Chii-Horng Li | 2022-03-01 |
| 11257951 | Method of making semiconductor device having first and second epitaxial materials | Lilly Su, Chii-Horng Li, Ming-Hua Yu, Pang-Yen Tsai, Tze-Liang Lee | 2022-02-22 |
| 11217672 | Method of forming a source/drain | Chien-Wei Lee, Hsueh-Chang Sung | 2022-01-04 |