Issued Patents 2022
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11527443 | Residue-free metal gate cutting for fin-like field effect transistor | Ya-Yi Tsai, Yi-Hsuan Hsiao, Shu-Yuan Ku, Ryan Chia-Jen Chen | 2022-12-13 |
| 11502076 | Semiconductor structure cutting process and structures formed thereby | Ryan Chia-Jen Chen, Cheng-Chung Chang, Shao-Hua Hsu, Yu-Hsien Lin, Li-Wei Yin +2 more | 2022-11-15 |
| 11482421 | Method of forming a semiconductor device by a replacement gate process | Shih-Yao Lin, Kuei-Yu Kao, Chih-Han Lin, Chao-Cheng Chen | 2022-10-25 |
| 11476347 | Processes for removing spikes from gates | Shih-Yao Lin, Kuei-Yu Kao, Chen-Ping Chen, Chih-Han Lin, Chao-Cheng Chen | 2022-10-18 |
| 11462408 | Method of forming an integrated circuit using a patterned mask layer | Tzu-Yen Hsieh, Chun-Hung Lee, Yih-Ann Lin, De-Fang Chen, Chao-Cheng Chen | 2022-10-04 |
| 11444080 | Semiconductor structure cutting process and structures formed thereby | Chih-Chang Hung, Chia-Jen Chen, Shu-Yuan Ku, Yi-Hsuan Hsiao, I-Wei Yang | 2022-09-13 |
| 11315272 | Image and video capture architecture for three-dimensional reconstruction | Junli Ping, Eric Michael Gros, Arpit Jain, Peter Henry Tu | 2022-04-26 |
| 11309403 | Fin field-effect transistor device and method of forming the same | Shih-Yao Lin, Kuei-Yu Kao, Chih-Han Lin, Chao-Cheng Chen | 2022-04-19 |
| 11302581 | Gate profile control through sidewall protection during etching | Shih-Yao Lin, Kuei-Yu Kao, Chih-Han Lin, Chao-Cheng Chen | 2022-04-12 |
| 11289585 | Semiconductor devices and methods of formation | Shih-Yao Lin, Kuei-Yu Kao, Chen-Ping Chen, Chih-Han Lin, Chao-Cheng Chen | 2022-03-29 |