Issued Patents 2022
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11532723 | Fin-end gate structures and method forming same | Shih-Yao Lin, Chen-Ping Chen, Chih-Han Lin | 2022-12-20 |
| 11522073 | Semiconductor devices and methods of manufacturing thereof | Shih-Yao Lin, Chih-Han Lin, Chen-Ping Chen, Hsiao-Wen Lee | 2022-12-06 |
| 11488858 | Methods for forming stacked layers and devices formed thereof | Shih-Yao Lin, Chen-Ping Chen, Chih-Han Lin | 2022-11-01 |
| 11482421 | Method of forming a semiconductor device by a replacement gate process | Shih-Yao Lin, Chih-Han Lin, Ming-Ching Chang, Chao-Cheng Chen | 2022-10-25 |
| 11476347 | Processes for removing spikes from gates | Shih-Yao Lin, Chen-Ping Chen, Chih-Han Lin, Ming-Ching Chang, Chao-Cheng Chen | 2022-10-18 |
| 11393769 | Alignment structure for semiconductor device and method of forming same | Chi-Sheng Lai, Wei-Chung Sun, Li Chen, Chih-Han Lin | 2022-07-19 |
| 11309403 | Fin field-effect transistor device and method of forming the same | Shih-Yao Lin, Chih-Han Lin, Ming-Ching Chang, Chao-Cheng Chen | 2022-04-19 |
| 11302581 | Gate profile control through sidewall protection during etching | Shih-Yao Lin, Chih-Han Lin, Ming-Ching Chang, Chao-Cheng Chen | 2022-04-12 |
| 11289585 | Semiconductor devices and methods of formation | Shih-Yao Lin, Chen-Ping Chen, Chih-Han Lin, Ming-Ching Chang, Chao-Cheng Chen | 2022-03-29 |
| 11264282 | Gate formation process | Chi-Sheng Lai, Wei-Chung Sun, Li Chen, Chih-Han Lin | 2022-03-01 |
| 11264283 | Multi-channel devices and methods of manufacture | Shih-Yao Lin, Chih-Chung Chiu, Chen-Ping Chen, Chih-Han Lin | 2022-03-01 |