Issued Patents 2022
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11529712 | CMP polishing head design for improving removal rate uniformity | Te-Chien Hou, Kuo-Yin Lin, Ming-Shiuan She, Shen-Nan Lee, Teng-Chun Tsai +1 more | 2022-12-20 |
CJ
Ching-Hong Jiang
Overall (2022): #499,576 of 548,613Top 95%
1
Patents 2022