Issued Patents 2022
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11515168 | Capacitively coupled plasma etching apparatus | Yunwen Huang, Jie Liang, Jinlong Zhao | 2022-11-29 |
| 11387084 | Uniform pumping dual-station vacuum processor | Yuejun GONG, Rason Zuo, Dee H. Wu, Ning Zhou, Kelvin Chen | 2022-07-12 |
| 11371141 | Plasma process apparatus with low particle contamination and method of operating the same | Rason Zuo, Shenjian Liu, Xingjian CHEN, Lei Wan | 2022-06-28 |
| 11373843 | Capacitively coupled plasma etching apparatus | Yunwen Huang, Jie Liang, Jinlong Zhao, Lei Wu | 2022-06-28 |
| 11363680 | Plasma reactor and heating apparatus therefor | Kui Zhao, Dee H. Wu | 2022-06-14 |
| 11348763 | Corrosion-resistant structure for a gas delivery system in a plasma processing apparatus | Zengdi Lian, Rason Zuo, Dee H. Wu, Yu Guan, Xingjian CHEN +1 more | 2022-05-31 |
| 11309165 | Gas showerhead, manufacturing method, and plasma apparatus including the gas showerhead | Zhaoyang Xu, Jiawei Jiang | 2022-04-19 |