Issued Patents 2022
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11515431 | Enabling residue free gap fill between nanosheets | Ekmini Anuja De Silva, Jing Guo, Ruqiang Bao, Muthumanickam Sankarapandian, Nelson Felix | 2022-11-29 |
| 11500293 | Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer | Ekmini Anuja De Silva, Jing Guo, Ashim Dutta, Nelson Felix | 2022-11-15 |
| 11276767 | Additive core subtractive liner for metal cut etch processes | Ruqiang Bao, Kisup Chung, Andrew M. Greene, Sivananda K. Kanakasabapathy, David L. Rath +1 more | 2022-03-15 |
| 11251182 | Staggered stacked vertical crystalline semiconducting channels | Tsung-Sheng Kang, Tao Li, Ardasheir Rahman, Praveen Joseph, Ekmini Anuja De Silva | 2022-02-15 |
| 11245027 | Bottom source/drain etch with fin-cut-last-VTFET | Tao Li, Nelson Felix, Eric R. Miller | 2022-02-08 |