Issued Patents 2022
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11515431 | Enabling residue free gap fill between nanosheets | Indira Seshadri, Ekmini Anuja De Silva, Jing Guo, Ruqiang Bao, Muthumanickam Sankarapandian | 2022-11-29 |
| 11500293 | Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer | Ekmini Anuja De Silva, Indira Seshadri, Jing Guo, Ashim Dutta | 2022-11-15 |
| 11300881 | Line break repairing layer for extreme ultraviolet patterning stacks | Luciana Meli Thompson, Jing Guo, Ekmini Anuja De Silva | 2022-04-12 |
| 11302573 | Semiconductor structure with fully aligned vias | Ekmini Anuja De Silva, Ashim Dutta, Praveen Joseph | 2022-04-12 |
| 11245027 | Bottom source/drain etch with fin-cut-last-VTFET | Tao Li, Indira Seshadri, Eric R. Miller | 2022-02-08 |
| 11239077 | Litho-etch-litho-etch with self-aligned blocks | Chi-Chun Liu, Yann Mignot, Ekmini Anuja De Silva, John C. Arnold, Allen H. Gabor | 2022-02-01 |
| 11226561 | Self-priming resist for generic inorganic hardmasks | Chi-Chun Liu, Indira Seshadri, Kristin Schmidt, Daniel P. Sanders, Jing Guo +2 more | 2022-01-18 |
| 11227793 | Self-aligned pattern formation for a semiconductor device | Sean D. Burns, Lawrence A. Clevenger, Sivananda K. Kanakasabapathy, Christopher J. Penny, Nicole Saulnier | 2022-01-18 |