Issued Patents 2021
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11187997 | Photolithography apparatus and method for handling wafer | Po-Ming SHIH | 2021-11-30 |
| 11137675 | Mask and method for forming the same | Ju-Wei Liao | 2021-10-05 |
| 11130107 | Method for providing deionized water with dynamic electrical resistivity | Wei Chang Cheng, Chien-Hung Wang | 2021-09-28 |
| 11099478 | Photomask having recessed region | Yu-Yu Chen | 2021-08-24 |
| 11099139 | Photolithography method and photolithography system | Wei Chang Cheng | 2021-08-24 |
| 11092892 | Substrate measuring device and a method of using the same | Min-Cheng Wu | 2021-08-17 |
| 11081383 | Substrate table with vacuum channels grid | Min-Cheng Wu | 2021-08-03 |
| 11067891 | Temperature controlling apparatus | Wei Chang Cheng | 2021-07-20 |
| 11056371 | Tool and method for cleaning electrostatic chuck | Yueh-Lin Yang | 2021-07-06 |
| 11035619 | Drainage for temperature and humidity controlling system | Wei Chang Cheng, Chien-Hung Wang, Guan-Yu Lin, Yung-Yao Lee | 2021-06-15 |
| 11022018 | Exhaust system and method of using | Wei Chang Cheng, Ping-Hsu Chen, T. S. Lo, Yung-Yao Lee | 2021-06-01 |
| 11016390 | Method for exposing wafer | Min-Cheng Wu | 2021-05-25 |
| 11003091 | Method of fabricating reticle | Hsueh-Yi Chung, Yung-Cheng Chen, Fei-Gwo Tsai, Shih-Chi Fu, Wei-Ti Hsu +4 more | 2021-05-11 |
| 11003087 | Radiation source supply system for lithographic tools | Yueh-Lin Yang | 2021-05-11 |
| 10987706 | Apparatus and methods for exhaust cleaning | Wei Chang Cheng, Cheng-Kuang Chen | 2021-04-27 |
| 10971352 | Cleaning method and apparatus | Min-Cheng Wu | 2021-04-06 |
| 10955741 | Reticle cleaning system and method for using the same | Wei Chang Cheng | 2021-03-23 |
| 10948824 | Dispensing nozzle design and dispensing method thereof | Wei Chang Cheng | 2021-03-16 |