Issued Patents 2021
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11204553 | Chemically amplified resist composition and patterning process | Jun Hatakeyama | 2021-12-21 |
| 11187980 | Resist composition and patterning process | Jun Hatakeyama | 2021-11-30 |
| 11181823 | Resist composition and patterning process | Jun Hatakeyama, Takayuki Fujiwara | 2021-11-23 |
| 11175580 | Resist composition and patterning process | Jun Hatakeyama, Takayuki Fujiwara | 2021-11-16 |
| 11163232 | Resist composition, patterning process, and barium salt | Jun Hatakeyama, Takeshi Sasami | 2021-11-02 |
| 11124477 | Sulfonium compound, positive resist composition, and resist pattern forming process | Naoya Inoue, Daisuke Domon, Keiichi Masunaga, Masaaki Kotake | 2021-09-21 |
| 11022881 | Photoacid generator, chemically amplified resist composition, and patterning process | Kazuya Honda, Takayuki Fujiwara, Kazuhiro Katayama | 2021-06-01 |
| 11022883 | Resist composition and patterning process | Jun Hatakeyama | 2021-06-01 |