Issued Patents 2021
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11022881 | Photoacid generator, chemically amplified resist composition, and patterning process | Kazuya Honda, Takayuki Fujiwara, Masaki Ohashi | 2021-06-01 |
| 11009793 | Monomer, polymer, resist composition, and patterning process | Masahiro Fukushima, Masayoshi Sagehashi, Koji Hasegawa, Teppei Adachi | 2021-05-18 |
| 10921710 | Resist composition and pattern forming process | Teppei Adachi, Ryosuke Taniguchi | 2021-02-16 |