Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11204552 | Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent | Takehiko Naruoka, Ken MARUYAMA, Motohiro SHIRATANI, Hisashi Nakagawa | 2021-12-21 |
| 10995173 | Composition and pattern-forming method | Yuji Namie, Shinya Minegishi, Takuo Sone | 2021-05-04 |