Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211246 | Method and composition for selectively modifying base material surface | Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori | 2021-12-28 |
| 11204552 | Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent | Tomoki Nagai, Ken MARUYAMA, Motohiro SHIRATANI, Hisashi Nakagawa | 2021-12-21 |
| 10950438 | Method and composition for selectively modifying base material surface | Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori | 2021-03-16 |