Issued Patents 2021
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11204552 | Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent | Tomoki Nagai, Takehiko Naruoka, Ken MARUYAMA, Hisashi Nakagawa | 2021-12-21 |