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Lined photobucket structure for back end of line (BEOL) interconnect formation |
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Vertical thin film transistor structures with localized gate dielectric |
Brian S. Doyle, Elijah V. Karpov, Prashant Majhi, Ravi Pillarisetty, Abhishek A. Sharma |
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Dielectric helmet-based approaches for back end of line (BEOL) interconnect fabrication and structures resulting therefrom |
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Selective gate spacers for semiconductor devices |
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Photobucket floor colors with selective grafting |
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Differentiated molecular domains for selective hardmask fabrication and structures resulting therefrom |
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