Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211324 | Via contact patterning method to increase edge placement error margin | Mohit K. HARAN, Daniel James Bahr, Deepak S. Rao, Marvin Young Paik, Seungdo An +6 more | 2021-12-28 |
| 10930557 | Self-aligned contacts | Mark Bohr, Tahir Ghani, Nadia M. Rahhal-Orabi, Subhash M. Joshi, Joseph M. Steigerwald +2 more | 2021-02-23 |