Issued Patents 2021
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11205593 | Asymmetric fin trimming for fins of FinFET device | Johannes M. van Meer | 2021-12-21 |
| 11101183 | Gate spacer formation for scaled CMOS devices | Sony Varghese | 2021-08-24 |
| 11037788 | Integration of device regions | Sony Varghese | 2021-06-15 |
| 11018138 | Methods for forming dynamic random-access devices by implanting a drain through a spacer opening at the bottom of angled structures | Sony Varghese | 2021-05-25 |
| 10971403 | Structure and method of forming fin device having improved fin liner | Naushad K. Variam, Sony Varghese, Johannes M. van Meer, Jae-Young Lee | 2021-04-06 |
| 10930735 | Gate all around device and method of formation using angled ions | Sony Varghese, Anthony Renau, Morgan Evans, Joseph C. Olson | 2021-02-23 |
| 10923389 | Air-gap spacers for field-effect transistors | Chanro Park, Hoon Kim, Ruilong Xie | 2021-02-16 |
| 10903211 | Gate devices and methods of formation using angled ions | Anthony Renau, Sony Varghese, Morgan Evans, Naushad K. Variam, Tassie Andersen | 2021-01-26 |