Issued Patents 2021
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211230 | Gas flow system | Wei Wang, Alexander ERENSTEIN, John Mazzocco | 2021-12-28 |
| D934315 | Deposition ring for a substrate processing chamber | Ilya Lavitsky, Goichi Yoshidome | 2021-10-26 |
| 11037768 | Methods and apparatus for controlling ion fraction in physical vapor deposition processes | Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Martin Lee Riker, William Fruchterman +4 more | 2021-06-15 |
| 10998172 | Substrate processing chamber having improved process volume sealing | Ilya Lavitsky, John Mazzocco | 2021-05-04 |