Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10725377 | Chemically amplified negative resist composition and resist pattern forming process | Masaaki Kotake, Satoshi Watanabe, Kenji Yamada, Masaki Ohashi | 2020-07-28 |
| 10585345 | Photomask blank, method for manufacturing photomask, and mask pattern formation method | Shigeo Irie, Takashi Yoshii, Yukio Inazuki, Hideo Kaneko, Toyohisa Sakurada | 2020-03-10 |