Issued Patents 2020
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10871712 | Stepped substrate-coating composition containing polyether resin having photocrosslinkable group | Hikaru TOKUNAGA, Takafumi Endo, Keisuke Hashimoto | 2020-12-22 |
| 10865262 | Upper-layer film forming composition and method for producing a phase-separated pattern | Ryuta MIZUOCHI, Yasunobu Someya, Hiroyuki Wakayama | 2020-12-15 |
| 10838303 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton | Wataru SHIBAYAMA, Makoto Nakajima, Yuichi Goto | 2020-11-17 |
| 10809619 | Resist underlayer film-forming composition containing substituted crosslinkable compound | Keisuke Hashimoto, Kenji Takase, Tetsuya Shinjo, Takafumi Endo, Hirokazu Nishimaki | 2020-10-20 |
| 10804111 | Method for roughening surface using wet treatment | Keisuke Hashimoto, Yasunobu Someya, Takahiro Kishioka | 2020-10-13 |
| 10795261 | Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same | Tokio NISHITA | 2020-10-06 |
| 10684546 | Composition for forming resist underlayer film | Yasushi Sakaida, Kenji Takase, Takahiro Kishioka | 2020-06-16 |
| 10613440 | Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate | Wataru SHIBAYAMA, Shuhei Shigaki | 2020-04-07 |
| 10613435 | Coating solution for resist pattern coating and method for forming pattern | Tokio NISHITA | 2020-04-07 |
| 10585353 | Resist underlayer film forming composition | Hirokazu Nishimaki, Keisuke Hashimoto | 2020-03-10 |
| 10558119 | Composition for coating resist pattern | Wataru SHIBAYAMA, Makoto Nakajima, Shuhei Shigaki, Hiroaki Yaguchi | 2020-02-11 |