Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10808317 | Deposition apparatus including an isothermal processing zone | Ramesh Chandrasekharan, Karl Leeser, Alan M. Schoepp | 2020-10-20 |
| 10781516 | Chemical deposition chamber having gas seal | Ramesh Chandrasekharan, Saangrut Sangplung | 2020-09-22 |
| 10619245 | Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate | Edward Augustyniak | 2020-04-14 |