Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10712677 | Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning | Irene Ament, Dirk Heinrich Ehm, Stefan Schmidt, Stefan Wiesner, Diana Urich | 2020-07-14 |
| 10649340 | Reflective optical element for EUV lithography | Dirk Heinrich Ehm, Vitaliy Shklover, Irene Ament, Stefan Schmidt, Stefan Wiesner +6 more | 2020-05-12 |
| 10627217 | Method for determining the thickness of a contaminating layer and/or the type of contaminating material, optical element and EUV-lithography system | Irene Ament | 2020-04-21 |