Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10712677 | Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning | Irene Ament, Stefan Schmidt, Moritz Becker, Stefan Wiesner, Diana Urich | 2020-07-14 |
| 10690812 | Optical element and optical system for EUV lithography, and method for treating such an optical element | Hermanus Hendricus Petrus Theodorus Bekman, Jeroen Huijbregtse, Arnoldus Jan Storm, Tina Graber, Irene Ament +3 more | 2020-06-23 |
| 10649340 | Reflective optical element for EUV lithography | Vitaliy Shklover, Irene Ament, Stefan Schmidt, Moritz Becker, Stefan Wiesner +6 more | 2020-05-12 |