Issued Patents 2020
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10712677 | Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning | Dirk Heinrich Ehm, Stefan Schmidt, Moritz Becker, Stefan Wiesner, Diana Urich | 2020-07-14 |
| 10690812 | Optical element and optical system for EUV lithography, and method for treating such an optical element | Hermanus Hendricus Petrus Theodorus Bekman, Dirk Heinrich Ehm, Jeroen Huijbregtse, Arnoldus Jan Storm, Tina Graber +3 more | 2020-06-23 |
| 10649340 | Reflective optical element for EUV lithography | Dirk Heinrich Ehm, Vitaliy Shklover, Stefan Schmidt, Moritz Becker, Stefan Wiesner +6 more | 2020-05-12 |
| 10627217 | Method for determining the thickness of a contaminating layer and/or the type of contaminating material, optical element and EUV-lithography system | Moritz Becker | 2020-04-21 |