| 10867853 |
Subtractive plug and tab patterning with photobuckets for back end of line (BEOL) spacer-based interconnects |
Kevin Lin, Richard E. Schenker |
2020-12-15 |
| 10804141 |
Damascene plug and tab patterning with photobuckets for back end of line (BEOL) spacer-based interconnects |
Kevin Lin, Richard E. Schenker |
2020-10-13 |
| 10796909 |
Surface-aligned lithographic patterning approaches for back end of line (BEOL) interconnect fabrication |
Kevin Lin, James M. Blackwell |
2020-10-06 |
| 10692757 |
Means to decouple the diffusion and solubility switch mechanisms of photoresists |
Marie Krysak, Paul A. Nyhus, Michael J. Leeson |
2020-06-23 |
| 10644113 |
Quantum dot array devices |
James S. Clarke, Ravi Pillarisetty, Jeanette M. Roberts, Hubert C. George, Nicole K. Thomas |
2020-05-05 |
| 10615117 |
Self-aligned via |
Kevin Lin, Rami Hourani, James M. Blackwell |
2020-04-07 |
| 10593627 |
Doric pillar supported maskless airgap structure for capacitance benefit with unlanded via solution |
Kanwal Jit Singh, Kevin Lin |
2020-03-17 |
| 10553532 |
Structure and method to self align via to top and bottom of tight pitch metal interconnect layers |
Richard E. Schenker, Manish Chandhok, Mauro J. Kobrinsky, Kevin Lin |
2020-02-04 |