Issued Patents 2020
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10816483 | Double pass diluted ultraviolet reticle inspection | Guoxiang Ning, Paul Ackmann, Jung-Yu Hsieh, Ming Lei | 2020-10-27 |
| 10768521 | Extreme ultraviolet (EUV) mask absorber and method for forming the same | Amr Y. Abdo, Lei Zhuang | 2020-09-08 |
| 10712498 | Shielding structures between optical waveguides | John J. Ellis-Monaghan, Jeffrey P. Gambino, Mark D. Jaffe, Kirk D. Peterson | 2020-07-14 |
| 10564554 | System and method for analyzing printed masks for lithography based on representative contours | Liang Cao, Jie Zhang, Yulu Chen | 2020-02-18 |
| 10552569 | Method for calculating non-correctable EUV blank flatness for blank dispositioning | Christina A. Turley, Xuemei Chen, Allen H. Gabor, Timothy A. Brunner | 2020-02-04 |