Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10802393 | Extreme ultraviolet (EUV) lithography mask | Lei Sun, Obert R. Wood, II, Genevieve Beique, Erik Verduijn, Francis Goodwin | 2020-10-13 |
| 10564554 | System and method for analyzing printed masks for lithography based on representative contours | Liang Cao, Jed H. Rankin, Jie Zhang | 2020-02-18 |