Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10670955 | Critical dimension variation correction in extreme ultraviolet lithography | Sergey Oshemkov, Vladimir Kruglyakov, Frederik Blumrich | 2020-06-02 |
| 10578975 | Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography | Thomas Thaler, Joachim Welte, Kujan Gorhad, Vladimir Dmitriev, Ute Buttgereit +1 more | 2020-03-03 |