Issued Patents 2019
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10520818 | Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask | Tom Zhong, Zhongjian Teng | 2019-12-31 |
| 10522751 | MTJ CD variation by HM trimming | Dongna Shen, Yi Yang, Yu-Jen Wang | 2019-12-31 |
| 10475987 | Method for fabricating a magnetic tunneling junction (MTJ) structure | Tom Zhong, Vinh Lam, Vignesh Sundar, Zhongjian Teng | 2019-11-12 |
| 10475991 | Fabrication of large height top metal electrode for sub-60nm magnetoresistive random access memory (MRAM) devices | Yi Yang, Zhongjian Teng, Yu-Jen Wang | 2019-11-12 |
| 10446741 | Multiple hard mask patterning to fabricate 20nm and below MRAM devices | Yi Yang, Yu-Jen Wang, Tom Zhong | 2019-10-15 |
| 10359699 | Self-adaptive halogen treatment to improve photoresist pattern and magnetoresistive random access memory (MRAM) device uniformity | Yi Yang, Dongna Shen, Yu-Jen Wang | 2019-07-23 |