Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10520818 | Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask | Jesmin Haq, Zhongjian Teng | 2019-12-31 |
| 10475987 | Method for fabricating a magnetic tunneling junction (MTJ) structure | Jesmin Haq, Vinh Lam, Vignesh Sundar, Zhongjian Teng | 2019-11-12 |
| 10446741 | Multiple hard mask patterning to fabricate 20nm and below MRAM devices | Yi Yang, Yu-Jen Wang, Jesmin Haq | 2019-10-15 |