Issued Patents 2019
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10508181 | Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound | Yasunobu Someya, Hiroyuki Wakayama, Takafumi Endo | 2019-12-17 |
| 10437150 | Composition for forming resist underlayer film with reduced outgassing | Bangching Ho, Takafumi Endo | 2019-10-08 |
| 10394124 | Resist underlayer film-forming composition containing polymer having arylene group | Keisuke Hashimoto, Hirokazu Nishimaki, Takafumi Endo | 2019-08-27 |
| 10372040 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group | Wataru SHIBAYAMA, Kenji Takase | 2019-08-06 |
| 10295907 | Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure | Ryo Karasawa, Yasunobu Someya, Takafumi Endo, Tokio NISHITA | 2019-05-21 |
| 10289002 | Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer | Yasushi Sakaida, Ryuta MIZUOCHI | 2019-05-14 |
| 10280328 | Bottom layer film-forming composition of self-organizing film containing styrene structure | Yasunobu Someya, Hiroyuki Wakayama, Takafumi Endo | 2019-05-07 |
| 10242871 | Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group | Tokio NISHITA, Noriaki Fujitani | 2019-03-26 |
| 10191374 | Resist underlayer film-forming composition | Hirokazu Nishimaki, Keisuke Hashimoto, Takafumi Endo | 2019-01-29 |