Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10295907 | Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure | Ryo Karasawa, Yasunobu Someya, Takafumi Endo, Rikimaru Sakamoto | 2019-05-21 |
| 10242871 | Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group | Noriaki Fujitani, Rikimaru Sakamoto | 2019-03-26 |