Issued Patents 2019
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10508181 | Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound | Yasunobu Someya, Hiroyuki Wakayama, Rikimaru Sakamoto | 2019-12-17 |
| 10437150 | Composition for forming resist underlayer film with reduced outgassing | Rikimaru Sakamoto, Bangching Ho | 2019-10-08 |
| 10394124 | Resist underlayer film-forming composition containing polymer having arylene group | Keisuke Hashimoto, Rikimaru Sakamoto, Hirokazu Nishimaki | 2019-08-27 |
| 10295907 | Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure | Ryo Karasawa, Yasunobu Someya, Tokio NISHITA, Rikimaru Sakamoto | 2019-05-21 |
| 10280328 | Bottom layer film-forming composition of self-organizing film containing styrene structure | Yasunobu Someya, Hiroyuki Wakayama, Rikimaru Sakamoto | 2019-05-07 |
| 10191374 | Resist underlayer film-forming composition | Hirokazu Nishimaki, Keisuke Hashimoto, Rikimaru Sakamoto | 2019-01-29 |