Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10372040 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group | Kenji Takase, Rikimaru Sakamoto | 2019-08-06 |
| 10197917 | Silicon-containing resists underlayer film-forming composition having phenyl group-containing chromophore | Makoto Nakajima, Satoshi Takeda, Kenji Takase | 2019-02-05 |