Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10472717 | Gas supply system, plasma processing apparatus, and operation method for plasma processing apparatus | Atsushi Sawachi, Norikazu Sasaki, Yoshiyasu Sato, Kenichi Nogami | 2019-11-12 |
| 10316835 | Method of determining output flow rate of gas output by flow rate controller of substrate processing apparatus | Shinichiro Hayasaka, Toshihiro TSURUTA, Hiroshi Fujii, Junichi Akiba, Naoya Jami +1 more | 2019-06-11 |