Issued Patents 2019
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10474033 | Method and apparatus for post exposure processing of photoresist wafers | Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-11-12 |
| 10401742 | Post exposure processing apparatus | Ludovic Godet, Kyle M. Hanson, Robert B. Moore | 2019-09-03 |
| 10203604 | Method and apparatus for post exposure processing of photoresist wafers | Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-02-12 |