Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10395883 | Aperture size modulation to enhance ebeam patterning resolution | Mark C. Phillips, Gabriele Canzi | 2019-08-27 |
| 10338474 | Underlying absorbing or conducting layer for Ebeam direct write (EBDW) lithography | Yan Borodovsky, Charles H. Wallace, Paul A. Nyhus | 2019-07-02 |